Electron Beam Evaporator Power Supply EBV40A-PS

Description

A key feature of the EBV40A is the integrated flux monitor. Evaporant flux is indirectly monitored via the measured ion current, providing accurate flux adjustment and faster deposition rate control. The ion collector is contained within the beam exit column. At a given electron emission current and beam energy the measured ion flux measured is directly proportional to the flux of evaporated atoms. The EBV40A-PS is equipped with built-in PID controller which stabilizes evaporant flux at the desired level. The unit can be operated in AUTO mode (with ion flux control) or MANUAL mode (without ion flux control). The EBV40A-PS can be supplied as a full width 19” rack mounting unit (3U height) or free standing.

The unit is also fully software controlled and web-enabled so that it can be operated over any network, including the internet.

Only one communication interface can be chosen at time of order (please refer to table) but this can be easily changed in the future via simple rear panel plugin connection modules, without ever having to access the internals of the unit.

Application

The EBV40A-PS power supply drives the EBV40A Electron Beam Evaporator for ultra-pure sub-monolayer and multilayer growth in MBE applications.

Software

Full dedicated software application or library module.

Note

Full dedicated software application or library module.

Technical data

* Only one comms interface can be used at any one time and is chosen at time of order. However, this may be swapped/interchanged with any other comms interface at any future date via simple rear panel plug and play swap, without having to access the internals of the unit.