Electron beam evaporator EBV 40A1
The electron beam evaporator EBV 40A1 is designed for ultra-pure sub-monolayer and multilayer thin film growth by molecular beam epitaxy. The precisely defined evaporant beam means highly uniform deposition on the sample, the deposition area being determined by the distance from the E-beam evaporator to the sample and the choice of one of the easily exchangeable exit apertures. The electron beam evaporator EBV 40A1 is configured with choice of manual or automatic shutter.
Features
- Manual or electro-pneumatic shutter, integrated PID flux monitor
- W/Th-filament for evaporation from rod material or from small conductable crucible
- Wide range of exchangeable exit apertures
- Excellent water cooling with multiple cooling channels
- Suitable for various materials
- Unique high reliability design
- Extremely high power densities
- Software control (basic version)
Options
- Software extension – can be integrated with RAPID SE
- Customised insertion length
- With or without integrated manual/electro-pneumatic shutter
- Linear shift
Technical data
Power: |
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Mounting flange: | Rotatable, DN 40CF |
Bakeout temperature: | Up to 250°C (fully bakeable) |
Water cooling: | Required |
Beam divergence | 4 – 19 mm |
Insertion length: | Min. 190 mm (other on request) OD: 35 mm |
Energy range: | 1 – 1500 eV |
Spot size: | Dependent on working distance |
Cathode type: | Thoriated Tungsten |
Temperature range: | 160°C – 2300°C (3300°C for molybdenum connector) |
Filament current: | Typically 1,8 - 2,2 A, max 2,3 A |
Evaporating rod diameter: | 2 - 6 mm ; step 2 mm, wire feed 25 mm wire lengh 45 mm |
crucible type | Knudsen cell type made from: Mo, W, liner PBN, Al2O3 |
Crucibles volume: | 0,07 ml |
Evaporated materials | All typical materials according to crucible type |
Exit aperture diameters | Set 1: ID 4, ID 6, ID 7.4 (standard) Set 2: ID 10, ID 14, ID 19 |
others |
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