Multitechnique UHV system for multilayer epitaxial films [project 022]


Custom multi-chamber UHV system for the analysis of atomic and electronic surface structure, in­vestigation and preparation of complex epitaxial me­tallic or molecular films on surfaces and chemical analysis of interfaces in multilayer film samples.


Multi-chamber system designed around a central radial distribution chamber with attached analytical cham­bers and auxiliary chambers fulfilling the demands of sample transport under true UHV conditions (pres­sure lower than 10-10 mbar). The base pressure in the analytical chambers is < 5*10-11 mbar. The central radial distribution chamber is connected to a second distribu­tion chamber with the same design via a reorientation chamber. The second system provides a connection to a commercial high performance XPS system and access to a second preparation chamber, load-lock and sample storage chamber.

  • Multitechnique analytical chamber integrating several surface analysis methods;X-ray Photoelectron Spectroscopy (XPS), Monochromatic Ultraviolet Pho­toelectron Spectroscopy (UPS), Ion Scattering Spec­troscopy (ISS) and Auger Electron Spectroscopy (AES). Sample positioning is via a stable, high precision, 5 axis manipulator with two rotational axes motorised. The sample receiving station is equipped with a LN2 cry­ostat that allows temperature variation over the range -180°C to 1000°C. The mu-metal chamber is equipped with a hemispherical analyser, X-ray source, UV source with monochromator, electron source and flood gun. The flexible design allows easy modification according to future scientific demands.
  • The 5 axis manipulator and dedicated software allow the measurement of X-ray Photoelectron Diffraction data (XPD) with an angular resolution and repeatability of better then 0.1 degree.
  • Chamber for Infrared Spectroscopy (FT-IR) with com­mercial IR spectrometer that can also be used as a stan­dalone instrument. The sample can be heated and co­oled during measurements and the chamber is equipped with gas dosing and electron beam evaporator for in-situ sample preparation.
  • Three level preparation chamber, equipped with LEED, ion source, electron beam evaporator, Knudsen cells, and numerous ports which can be used for future expansion.
  • Storage chamber for 6 sample holders.
  • Load lock chamber prepared with detachable glove box for either simple sample loading or sample prepa­ration under reduced oxygen and water atmosphere.