Customised multitechnique UHV system [092]
Description
Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques, especially:
- X-ray Photoelectron Spectroscopy (XPS)
- Ultraviolet Photoemission Spectroscopy (UPS)
- Auger Electron Spectroscopy (AES)
- Scanning Probe Microscopy (SPM)
- Low Energy Electron Diffraction (LEED)
- Temperature Programmed Desorption (TPD)
The system consists of:
- spectroscopy chamber with analyzer (incl. instrumentation and software) which allows to use XPS, UPS, AES, EPS, TPD techniques. The analyzer enable XPS measurement with high resolution (<20mm), precise and depth profiling on selected surface ≤ 1x1mm, possibility of chemical imaging and angular-resolved measurement
- variable temperature STM/AFM chamber with instrumentation and software which is dedicated to atomic resolution measurements
- preparation chamber dedicated to preparing samples, equipped with AES/LEED spectrometer and thermal desorption spectrometer with residual gas analyzer (incl. instrumentation and software)
The system is additionally equipped with:
- sample loading, transferring and storage
- a device for sample preparing and cleaning
- UHV Flow Through High Pressure Reactor dedicated to spectrometric and chromatographic gas analysis
- gas dosing
- pressure and temperature measurement and control system
- vacuum controlling system
- sample temperature measurement and control system
Measurement temperature range is 100-2300°K. The system allows independent and simultaneous use of electron spectroscopy techniques. The flexible design allows easy modification to meet future scientific demands.