State of the Art E-Beam Lithography Systems

Obducat offers two configurations of the EBR system suitable for industrial production as well as R&D work. Both configurations are designed to handle substrates up to 8-inch in diameter. The 30 kV configurations are based on a 30kV TFE column with a high-speed beam blanker and a stage control, which delivers high accuracy positioning capabilities. The high performance configuration is based on a 50kV column with high speed blanking system and ultra high precision feedback system for stage control enabling exposures with very high resolution. The systems also have a dynamic auto focusing system integrated to enable high-resolution exposure on non-flat substrates.

Obducat offers Electron Beam Recorders (EBR) for lithographic mastering on rotating substrate with a resolution down to 10nm, based on the EBR 200 platform. The system produces a Gaussian beam spot down to 2nm. This together with the high-speed beam blanker, the high precision linear stage and rotation spindle makes it possible to pattern substrates with e.g. spiral and concentric patterns at short exposure time. Our system supports a number of existing and future formats for optical as well as magnetic media industries. The encoder provides full flexibility to adjust the design of any media format within the specification.