Manufacturers
Applications

| PV010A custom multi-chamber UHV system for the investigation of physical and chemical properties of novel catalyst materials.

| PV014A custom multichamber UHV system for the preparation and investigation of organic films (OLEDs).

| PV022Custom multi-chamber UHV system for the analysis of atomic and electronic surface structure, in­vestigation and preparation of complex epitaxial me­tallic or molecular films on surfaces and chemical analysis of interfaces in multilayer film samples.

| PV042The ARPES system is a customised multi-chamber UHV sys­tem for the investigation of physical properties (electronic band structure) of high temperature super­conductors.

| PV052System designed for studies of thermodynamics and kinetics of phase transformation.

| PV053Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

| PV063Ultra high vacuum system for investigation of surface conditions of samples under controlled conditions.

| PV072A system designed for ARPES research

| PV075A system designed for IR measurements.

| PV080Multichamber UHV system dedicated to preparation of thin layers and complex analysis of surface solid samples with scanning probe microscopy and other research methods.

| PV090This multifunctional system is designed for precise and varied analysis of material surfaces.

| PV092Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques.

| PV093Multifunctional UHV system for range of studies.

| PV097Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques.

| PV128The magnetron sputtering system is dedicated to accurate and reproducible thin film layer deposition.

| STSThe Vacuum Pumping System STS is a complex portable device for vacuum generation with TMP, which consists of an electronic control panel with LCD graphic display and built-in vacuum devices

| XY_stageThe XY Stage is a precision, high rigidity UHV specimen translator having X and Y motions. The standard mounting flange is DN 160CF. A DN 100CF mounting flange version is also available. The translator can work in any orientation

| Prevac_UMSThe device is equally suited for use in scientific and industrial fields. It can be used for gas analysis and thermal dysorption experiments.

| Flow_Through_High_Pressure_ReactorsFlow Through High Pressure Reactors

| Static_High_Pressure_ReactorsStatic High Pressure Reactors

| Radial_Distribution_Chambers_(UFO)Radial Distribution Chambers (UFO)

| PTS_STANDARD_sample_holderPTS STANDARD sample holder

| PTS_POWDER_sample_holderPTS POWDER sample holder

| PTS_BASE_CONTAINER_sample_holderPTS BASE CONTAINER sample holder

| PTS_1000_RES_C_K_sample_holderPTS 1000 RES/C-K sample holder

| PTS_CLEAV_RES_C_K_sample_holderPTS CLEAV RES/C-K sample holder

| PTS_1000_IR_RES_C_K_sample_holderPTS 1000 IR RES/C-K sample holder

| PTS_1000_OMC_RES_C_K_sample_holderPTS 1000 OMC RES/C-K sample holder

| PTS_1400_OMC_EB_C_K_sample_holderPTS 1400 OMC EB/C-K sample holder

| PTS_1200_RHK_EB_C_K_sample_holderPTS 1200 RHK EB/C-K sample holder

| PTS_SPM_DIR_C_K_sample_holderPTS SPM DIR/C-K sample holder

| PTS_SPM_CLEAV_sample_holderPTS SPM CLEAV sample holder

| PTS_SPM_2000_EB_C_C_sample_holderPTS SPM 2000 EB/C-C sample holder

| PTS_QUARTZ_sample_holderPTS QUARTZ sample holder

| PTS_FARA_EXTRA_CAPABILITY_sample_holderPTS FARA EXTRA CAPABILITY sample holder

| PTS_200_RES_sample_holderPTS 200 RES sample holder

| Electron_beam_evaporator_EBV_40A1Electron beam evaporator EBV 40A1

| Thermal_Desorption_Spectrometer_TDS_40A1Thermal Desorption Spectrometer TDS 40A1

| Stepper_Motor_Shift_for_Z_SlideStepper Motor Shift for Z Slide

| Motorised_Rotation_Module_R2Motorised Rotation Module R2

| High_Stability_Linear_ShiftHigh Stability Linear Shift

| Differently_Pumped_Rotary_FeedthroughDifferently Pumped Rotary Feedthrough

| Motorised_Third_Rotation_Module_R3Motorised Third Rotation Module R3

| Motorised_Rotation_Module_-_In_Line_SolutionMotorised Rotation Module - In Line Solution

| Stepper_Motor_Shift_for_XY_StagesStepper Motor Shift for XY Stages

| 2_axes_deposition_manipulator2 axes deposition manipulator

| 5_axes_LHe_Cryostat_Manipulator_closed5 axes LHe Cryostat Manipulator (closed cycle, 20K)

| 5_Axes_LHe_Cryostat_Manipulator_open5 Axes LHe Cryostat Manipulator (open cycle, 4.8K) [project 330]

| 5_Axes_Manipulator5 Axes Manipulator [project 359]

| 6_Axes_LHe_Cryostat_Manipulator6 Axes LHe Cryostat Manipulator (open cycle, 7K) [project 338]

| Wobble_Stick_with_Rotating_TipWobble Stick with Rotating Tip

| Wobble_Stick_with_Parallel_Mobile_TipWobble Stick with Parallel Mobile Tip

| Wobble_Stick_with_Gripping_and_Rotating_TipWobble Stick with Gripping and Rotating Tip

| Wobble_Stick_with_Gripping_ArmsWobble Stick with Gripping Arms

| Wobble_Stick_with_CleaverWobble Stick with Cleaver

| Ion_Source_Power_Supply_IS40C-PSIon Source Power Supply IS40C-PS

| Bakeout_Control_Unit_BCU14Bakeout Control Unit BCU14

| Ion_Source_Power_Supply_IS40E-PSIon Source Power Supply IS40E-PS

| Titanium_Sublimation_Pump_Power_Supply_TSP02-PSTitanium Sublimation Pump Power Supply TSP02-PS

| Electron_Beam_Evaporator_Power_Supply_EBV40A-PSElectron Beam Evaporator Power Supply EBV40A-PS

| Electron_Source_Power_Supply_ES40C-PSElectron Source Power Supply ES40C-PS

| Flood_Source_Power_Supply_FS40A-PSFlood Source Power Supply FS40A-PS

| X-Ray_Source_Electronics_XR40BX-Ray Source Electronics XR40B

| UV_Source_Power_Supply_UV40A-PSUV Source Power Supply UV40A-PS

| Heating_Power_Supply_HEAT3-PSHeating Power Supply HEAT3-PS

| Power_Control_Unit_PCU16Power Control Unit PCU16

| Multi_Gauge_Controller_MG12Multi Gauge Controller MG12

| Ion_Multi_Gauge_Controller_MG13Ion Multi Gauge Controller MG13

| Thickness_Monitors_Controller_TMC-13Thickness Monitors Controller TMC-13

| Ion_Multi_Gauge_Controller_MG14Ion Multi Gauge Controller MG14

| Thickness_Monitors_TM13_TM14Thickness Monitors TM13 & TM14

| Stepper_Motor_Control_Device_SMCD10Stepper Motor Control Device SMCD10

| Stepper_Motor_Control_Device_SMCD20Stepper Motor Control Device SMCD20

| Vacuum_Chamber_Highlight_VCH-10Vacuum Chamber Highlight VCH-10

| Rapid_Scientific_EnvironmentRapid Scientific Environment

| Heating_Temperature_ControllerHeating & Temperature Controller

| Electron_Beam_Evaporator_ControlElectron Beam Evaporator Control

| Multiaxes_Manipulator_Control_ApplicationMultiaxes Manipulator Control Application

| Quartz_Balance_Control_ApplicationQuartz Balance Control Application

| Heater_Power_Supply_ControlHeater Power Supply Control

| Titanium_Sublimation_Pump_(TSP)_ControlTitanium Sublimation Pump (TSP) Control

| Thermal_Desorption_SpectrometerThermal Desorption Spectrometer

| Bath_Cryostat_MagnoAs a standard cryostat for the temperature range between 1,2-4,2 K "wide neck"-bath cryostats are manufactured with various neck diameter and capacities, consisting of vacuum chamber, Helium-, and Nitrogen-tank.

| Bath_Cryostat_Magno-SpektroAs a standard cryostat for the temperature range between 1,2-4,2 K "wide neck"-bath cryostats are manufactured with various neck diameter and capacities, consisting of vacuum chamber, Helium-, and Nitrogen-tank.

| Bath_Cryostat_SpektroAs a standard cryostat for the temperature range between 1,2-4,2 K "wide neck"-bath cryostats are manufactured with various neck diameter and capacities, consisting of vacuum chamber, Helium-, and Nitrogen-tank.

| He-Bath-Cryostat-MagnoAs a standard cryostat for the temperature range between 1,2-4,2 K "wide neck"-bath cryostats are manufactured with various neck diameter and capacities, consisting of vacuum chamber, Helium-, and Nitrogen-tank.

| KONTI-Cryostat_REM_1KONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat_REM_2KONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat_UHVKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat-ElecKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a N2-tank. As there is no need for a N2-bath these systems are small and compact.

| KONTI-Cryostat-MikroKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat-Mikro-6KONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat-MoessbauerKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-CryostatsKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat-SpektroKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat-Spektro_AKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat-Spektro_AEKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat-Spektro_AMKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat-UHV-STMKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-Cryostat-UHV-STM_TKONTI-Cryostats are supplied continously by specially designed transfer tubes out of a He-tank. As there is no need for a He-bath these systems are small and compact. Furthermore they can be used nearly towards every orientations.

| KONTI-IT-Cryostat_Magno-HeKONTI-IT-Cryostatsare continous flow cryostats with integrated liquid helium tank. It can be operated either as a bath cryostat or as an evaporator. For most applications, this cryostat type has a central sample chamber, which is accessed from the top

| KONTI-IT-Cryostat_Spektro-HeKONTI-IT-Cryostatsare continous flow cryostats with integrated liquid helium tank. It can be operated either as a bath cryostat or as an evaporator. For most applications, this cryostat type has a central sample chamber, which is accessed from the top

| KONTI-IT-Cryostat_Spektro-NKONTI-IT-Cryostatsare continous flow cryostats with integrated liquid helium tank. It can be operated either as a bath cryostat or as an evaporator. For most applications, this cryostat type has a central sample chamber, which is accessed from the top

| Temperature_Measurement_TIC-304_MAThe temperature measurement and control unit TIC 304-MA provides the possibility, to measure simultaneously with up to 2 different sensors. The temperature is displayed in Kelvin.

| 8500-FE-SEMThe Agilent 8500 FE-SEM is a compact system that offers researchers a field emission scanning electron microscope (FE-SEM) right in their own laboratory. The innovative 8500 has been optimized for low-voltage imaging, extremely high surface contrast and r

| 5500_AFMThe Agilent 5500 AFM/SPM microscope offers numerous unique features, such as patented top-down scanning and unrivalled environmental and temperature control, while providing maximum flexibility and modularity. The universal microscope base permits easy in

| 5100_AFMThe Agilent 5100 AFM/SPM microscope is a high-resolution system that provides excellent imaging capabilities in an easy-to-upgrade package. It is ideal for polymer, general surface characterization and materials applications. The Agilent 5100 AFM/SPM micr

| 5420_AFMBased on the popular Agilent 5400 AFM, the 5420 has been re-engineered to provide lower noise, better performance, and greater versatility. The 5420 offers a simple cost-effective upgrade program that includes choice of open loop and closed loop scanners,

| 5600LS_AFMThe modular Agilent 5600LS is the world’s finest commercially available AFM system that allows imaging of both large samples (in air) and small samples (in air, or in liquid under temperature control) with a 9μm scanner. The 5600LS utilizes the largest fu

| BM-10The BM-10 bench top platform offers 10-100 times better performance than a full size air table in a package only 4.6 inches tall and 12 inches wide and deep. It also does this without any air or electricity!

| BM-8The BM-8 bench top platform offers 10-100 times better performance than a full size air table in a package only 4.6 inches tall, and without air or electricity!

| MK-26The MK26 Series Vibration Control Workstation with more ergonomic comfort is designed specifically for ultra-low natural frequency applications.

| Reflectron_RFT10Our standard model RFT10 time-of-flight mass spectrometer is an extremely versatile instrument which is used in many different areas of research. The analyzed ions can originate from almost any ionisation process

| Reflectron_RFT50Reflectron RFT50 with electron impact ionisation, ion source mounted on flange opposite to the reflectron mounting flange, second detector with 20 kV post-acceleration behind the ion mirror

| Reflectron_CTF10Compact angled reflectron with two-stage ion mirror, optimized for very high sensitivity at medium to low mass resolution, (folded) field free drift space with overall length 380 mm

| Reflectron_CTF5Small angled reflectron with two-stage ion mirror, electron impact ionisation, (folded) field-free drift space with 395 mm overall length

| Reflectron_ILR10Сompact in-line reflectron with two-stage ion mirror, (folded) field free drift space with overall length 630 mm, large two-stage mcp (40 mm diameter) with central hole

| ETF11Minimum electron energy ca. 20 eV (depending on the magnetic fields of the environment)

| ETF15The bipolar setup allows to use the spectrometer either as a electron tof spectrometer with time-of-flight resolution T/ΔT > 100 or as a sensitive time-of-flight mass spectrometer with mass resolution M/ΔM > 300

| ETF20The ETF20 electron tof spectrometer is optimized for electron energies > 1000 eV. Conventional electron tof spectrometers (like our model ETF11) are difficult to operate in the high energy range because the time-of-flights can get very short (< 10 ns).

| OFT12Orthogonal extraction reflectron time-of-flight spectrometer OFT12, overall length ca. 900 mm, angle between in- and outgoing ion beam ca. 8°, field free drift length ca. 900 mm, two-stage ion reflector for second order energy focusing.

| EBRState of the Art E-Beam Lithography Systems

| EitreNano Imprint Lithography systems for Research & Development

| SindreSindre® - Nano Imprint Lithography system for Production

| Stamp_ManufacturingObducat delivers high quality stamps used for pattern replication of features ranging from sub-50 nm up to the micrometer scale.